Appeal No. 1997-3304 Page 8
Application No. 08/181,936
103 as being unpatentable over the appellants' prior art
disclosure (specification, pages 1 and 2) in view of
Philipossian.
Claims 1 and 8, the only two independent claims, both
require a chamber for collecting chemical by-products and a
tapered first pipe for introducing vapor into the chamber,
wherein the taper of the pipe reduces the pressure of the
vapor before entry thereof into the chamber.
At page 1 of appellants' specification it is disclosed
that "[i]t is well known in the art that semiconductor wafer
processing for integrated circuits includes processes that
require chemical vapor depositions...." Thereafter,
appellants
specify a low pressure chemical vapor deposition reactor from
which heated vapor exits to a trap to capture byproducts from
the heated vapor. There is recognition of a problem of
particle build up in the pipe at the inlet of the trap because
of the sudden pressure change between the pipe and trap filter
chamber and it is stated (specification, page 2) that "[t]o
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