Appeal No. 1998-0078
Application No. 08/478,814
APPENDIX
26. Etching equipment comprising:
an etching apparatus for main etching an object having a resist film as an etching
mask with a plasma produced by an etching gas;
a post-processing apparatus for removing a resist film remaining on the object
after the main etching step, a polymer deposited on the surface of the object, and a
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