Ex parte KOUCHIYAMA - Page 9




         Appeal No. 1998-1632                                    Page 9          
         Application No. 08/536,045                                              


                   forming said thin film of Ni-Fe by sputtering Ni and          
              Fe on said base material from an Ni target and a Fe                
              target disposed separately while said Ni target and said           
              Fe target and said base material are relatively rotated;           
              and                                                                
                   forming a plurality of thin layers of Ni and Fe               
              alternately.                                                       
              8.  The method according to claim 7, wherein an                    
              amount of Ni in the composition of the whole magneto-              
              resistance effect thin film is selected to be between 75           
              to 90 atomic percent.                                              
              9.  The method according to claim 7, wherein the                   
              thin layers of Ni and Fe are selected to be less than 10Å          
              thick.                                                             
                   10.  The method according to claim 7, wherein a               
              magneto-resistance changing ratio ??/?0 has a value                
              exceeding 3% and a coercive force Hch of less than 1.0.            
              11.  A method of manufacturing a magneto-resistance                
              effect magnetic head comprising the steps of:                      
                   providing a base material for forming thereon a thin          
              film for a magneto-resistance type magnetic head;                  
                   forming said thin film of Ni-Fe by sputtering Ni and          
              Fe on said base material from an Ni target and a Fe                
              target disposed separately while said Ni target and said           
              Fe                                                                 
              target and said base material are relatively rotated; and          
                   12.  The method according to claim 11, wherein an             
              amount of Ni in the composition of the whole magneto-              
              resistance effect thin film is selected to be between 75           
              to 90 atomic percent.                                              
                   13.  The method according to claim 11, wherein the            
              thin layers of Ni and Fe are selected to be less than 10Å          
              thick.                                                             
                   14.  The method according to claim 11, wherein a              
              magneto-resistance changing ratio ??/?0 has a value                
              exceeding 3% and a coercive force Hch of less than 1.0.            











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