Appeal No. 1998-2405
Application 08/351,093
Tanemura discloses a method for preparing a sample to be
examined using a transmission electron microscope, the method
comprising scanning the sample with radiation in the presence
of carbon-containing molecules floating in the atmosphere to
dissociate the molecules and thereby form a film in the
irradiated region, and then irradiating the sample with an ion
ray to remove portions of the sample not covered by the film
(pages 5 and 7). Regarding the type of radiation used in
forming the film, Tanemura states: “The irradiation is carried
out by means of radiations, i.e., electron ray, laser light,
X-ray, neutron ray or (-ray, etc. having energy necessary for
deposition of the molecules. Easily controllable electron
ray, laser light and X-ray are desired among them” (page 6).
The reference does not disclose forming the film using ion
beam radiation.
The examiner argues that, in view of the combined
teachings of Franke, Nakagawa and Ozaki, it would have been
obvious to one of ordinary skill in the art to form Tanemura’s
film using ion beam radiation “based upon the commonality of
the reactive etch conditions in the references and the
equivalence of the deposited materials with conventional
8
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