Ex parte SASAKI et al. - Page 5




           Appeal No. 2001-0118                                                                
           Application No. 09/013,927                                                          

                In place of these discarded theories, the examiner                             
           presents in his answer a new theory to support his obviousness                      
           conclusion regarding the “applying” step of appealed                                
           independent claim 2.  This new theory involves “traditional rf                      
           sputtering” and is described on pages 5 and 6 of the answer                         
           with the following language:                                                        
                      As noted above, the coil (16) in Barnes is                               
                necessary to better ionize sputter particles so that                           
                high aspect ratio holes can be filled.  Traditional                            
                rf sputtering does not utilize a coil.  It can then                            
                be reasonably stated that a substrate that does not                            
                have high aspect ratio holes (i.e. a plain flat                                
                substrate) would not need the coil because there are                           
                no holes to fill in the substrate.  Of course,                                 
                eliminating the coil involves losing the benefit of                            
                utilizing the coil (namely, to provide better                                  
                ionization), but the court has held that a component                           
                can be eliminated with a corresponding loss of                                 
                benefit.  In re Kuhle, 526 F.2d 553, 188 USPQ 7                                
                (CCPA 1975).  In this case, the corresponding loss                             
                of benefit would be the loss of filling high aspect                            
                ratio holes.  In other words, traditional rf                                   
                sputtering without a coil on a plain substrate would                           
                occur.  Therefore, in the traditional rf sputtering,                           
                ionized sputtering would occur with the power                                  
                applied solely to the target.  This fact has not                               
                been disputed by Appellant and in fact has been                                
                admitted by Appellant (Brief pages 19-20).                                     
                      Appellant has made no claim to the level of                              
                ionization that must occur.  Therefore, a minuscule                            
                amount of ionization (which will occur [in]                                    
                traditional rf sputtering as stated in Barnes and                              
                admitted by Appellant) will meet the limitation of                             
                claim 2.  Appellant is correct to say that                                     

                                              5                                                





Page:  Previous  1  2  3  4  5  6  7  8  9  Next 

Last modified: November 3, 2007