Appeal No. 2000-1057 Application 09/016,100 BACKGROUND The invention relates to a method for fabricating an integrated circuit. Appeal Brief, Paper No. 8, received April 20, 2000, page 2, Summary of the Invention. According to the method, a conductive layer is selectively etched using a silicide as a mask, thereby avoiding the need for a photoresist and reducing the formation of unwanted polymers. Id. In addition, use of the silicide mask avoids the need to etch through both a silicide layer and a conductive layer. Id. DISCUSSION The initial burden of presenting a prima facie case of obviousness rests on the examiner. In re Oetiker, 977 F.2d 1443, 1445, 24 USPQ2d 1443, 1444 (Fed. Cir. 1992). In determining whether an invention is obvious, the examiner must consider: (1) the scope and content of the prior art; (2) the differences between the prior art and the claimed invention; (3) the level of ordinary skill in the art; and (4) any objective considerations that may be present. Graham v. John Deere Co., 383 U.S. 1, 17-18, 148 USPQ 459, 466-67 (1966). To establish a 3Page: Previous 1 2 3 4 5 6 7 8 9 10 11 NextLast modified: November 3, 2007