Ex Parte HSIA et al - Page 3



          Appeal No. 2000-1057                                                        
          Application 09/016,100                                                      


                                     BACKGROUND                                       
                    The invention relates to a method for fabricating                 
          an integrated circuit.  Appeal Brief, Paper No. 8, received                 
          April 20, 2000, page 2, Summary of the Invention.  According to             
          the method, a conductive layer is selectively etched using a                
          silicide as a mask, thereby avoiding the need for a photoresist             
          and reducing the formation of unwanted polymers.  Id.  In                   
          addition, use of the silicide mask avoids the need to etch                  
          through both a silicide layer and a conductive layer.  Id.                  

                                     DISCUSSION                                       
                    The initial burden of presenting a prima facie case of            
          obviousness rests on the examiner.  In re Oetiker, 977 F.2d 1443,           
          1445, 24 USPQ2d 1443, 1444 (Fed. Cir. 1992).  In determining                
          whether an invention is obvious, the examiner must consider:                
          (1) the scope and content of the prior art; (2) the differences             
          between the prior art and the claimed invention; (3) the level of           
          ordinary skill in the art; and (4) any objective considerations             
          that may be present.  Graham v. John Deere Co., 383 U.S. 1,                 
          17-18, 148 USPQ 459, 466-67 (1966).  To establish a                         

                                          3                                           




Page:  Previous  1  2  3  4  5  6  7  8  9  10  11  Next 

Last modified: November 3, 2007