Appeal No. 2001-1662
Application No. 09/048,208
chronological order. In other words, it is apparent that each
step is intended to be completed prior to commencement of a
subsequent step. For example, it is clear that the step of
depositing a metal layer overlying said barrier metal layer can
not occur until after the barrier metal layer has been deposited
as recited in the prior step. Similarly, the step of
"selectively etching away all of said metal layer remaining
within said narrow spaces" can not occur until the step of
etching away the metal layer, such that some of the metal layer
remains in the narrow spaces, as recited in the prior step.
We do not find, nor has the examiner identified any teaching
or suggestion in Abraham of a two step etching procedure for
removal of the metal layer wherein, the first etching steps it
leaves a portion of the metal layer within narrow spaces and the
second step "selectively etches" away "all of said metal layer
remaining within said narrow spaces." See claim 1. Abraham
teaches an etching step which proceeds until the metalization
layer has been "substantially etched away." See e.g., column 7,
lines 22-24, column 8, lines 65-9, line 2. Abraham further
teaches that the step of etching the metalization layer may be
continued to ensure complete removal of the metalization layer.
See column 9, lines 8-13. However, the examiner has not
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