Appeal No. 1999-1674
Application No. 08/923,949
Claims 1 and 15 are representative of the subject matter on
appeal and read as follows:
1. A semiconductor wafer cleaning apparatus
comprising:
an outer tank;
a cleaning tank provided within said outer tank;
a wafer carrier provided within said cleaning tank;
a plurality of jet nozzles directed toward said wafer
carrier, each of said plurality of jet nozzles including a
plurality of jet nozzle holes formed lengthwise
therethrough, wherein a first of the plurality of jet
nozzles is located at a bottom center of the cleaning tank
with the plurality of jet nozzle holes facing upward and a
second of the plurality of jet nozzles is located at both
sides of the cleaning tank with the plurality of jet nozzle
holes facing a center of the wafer carrier at an oblique
angle;
a main pipe connected to said jet nozzles;
a circulating pump connected to said main pipe and said
outer tank for circulating a cleansing solution from said
outer tank, through said main pipe, said jet nozzles, and
said cleaning tank, and back to said outer tank, the
cleansing solution being directly sprayed from said jet
nozzles onto left, right, and bottom sides of the wafer; and
a filter for filtering said circulated cleansing
solution.
2
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