Appeal No. 1999-1674
Application No. 08/923,949
of poor circulation of the wafer cleaning liquid in the tank as
required by Seiichiro. To modify the nozzle arrangement contrary
to Seiichiro’s purpose is to destroy the invention on which
Seiichiro is based. See Ex parte Hartmann, 186 USPQ 366, 367
(Bd. App. 1974).
In view of the foregoing, we reverse the examiner’s decision
rejecting claims 1, 5, 15, 17 and 19 under 35 U.S.C. § 103.
REVERSED
CHUNG K. PAK )
Administrative Patent Judge )
)
)
) BOARD OF PATENT
PAUL LIEBERMAN ) APPEALS AND
Administrative Patent Judge ) INTERFERENCES
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)
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LINDA R. POTEATE )
Administrative Patent Judge )
CKP:hh
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