Appeal No. 1999-2122
Application No. 08/564,659
APPENDIX
103. An apparatus for providing a deposition on a planar
substrate, including,
a planar anode disposed in displaced and substantially
parallel relationship to the substrate,
a target spaced from the anode to serve as a cathode, the
target having properties of emitting sputtered atoms when bombarded
by gaseous ions and of directing the sputtered atoms to the
substrate, the target having a hollow substantially frusto-conical
configuration with an axis substantially perpendicular to the anode
and the substrate,
first means for defining a cavity between the anode and the
target for receiving atoms of an inert gas,
means for introducing the inert gas into the cavity,
second means for applying a positive voltage to the anode and
a negative voltage to the target relative to the positive voltage
on the anode to establish a flow of electrons from the target
toward the anode and a glow discharge between the target and the
anode to ionize atoms of the inert gas in the cavity, and
third means disposed relative to the anode and the target for
providing a movement of the electrons between the target and the
anode through other than a straight line path to enhance the
ionization of the atoms of the inert gas and the emission of the
sputtered atoms from the target for movement toward the substrate,
the third means being at a potential lower than the positive
voltage on the anode,
the voltage between the anode and the target having a
magnitude, and the positive voltage on the anode having a
magnitude, to obtain depositions of the sputtered atoms from the
target on the substrate with particular characteristics dependent
upon the magnitude of the anode voltage and the difference between
the anode voltage and the target voltage,
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