Interference No. 104,703
Page No. 5
D. Person of Ordinary Skill in the Art
F9. Generally, the technology involved in this interference relates to polymer chemistry and
more particularly, the field of photolithography and photoresist development. The knowledge
that one skilled in this art would possess is demonstrated by the prior art submitted as evidence,
e.g., Goodall U.S. Patent No. 5,569,730 (SX 1003).
1. Testimony of Toru Kajita
F10. Suwa has submitted two declarations by Toru Kajita, a named inventor of Suwa’s
involved ‘620 application. (Declarations of Toru Kajita, SX 1004 and SX 1018).
F11. According to Suwa, Mr. Kajita received his Bachelor of Science degree from Kyoto
University in 1986. Mr. Kajita is said to have received his Masters Degree in 1988 from Kyoto
University’s Department of Synthetic Chemistry. (Suwa Submission, Paper No. 45).
F12. Mr. Kajita began work at JSR Company, Ltd. in 1988. Mr. Kajita is said to have more
than ten years experience in the field of research and development of photoresist polymer
materials, including photoresists for semiconductor fabrication at JSR Company, Ltd. Mr. Kajita
is said to hold the title of Manager, Research and Development Department at JSR. (Paper No.
45).
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