Interference No. 104,703
Page No. 6
F13. Given Mr. Kajita’s background, we conclude that he is qualified to testify as to the
knowledge of one skilled in the art in the field of photolithography and photoresist development.
2. Testimony of John Sturtevant
F14. Suwa has submitted a declaration of a Mr. John Sturtevant. (SX 1005). In the
declaration, Mr. Sturtevant testifies that he has a Ph.D. in Physical Chemistry and is presently the
Manager of Photolithography Research and Development at Integrated Device Technology. Of
note, Mr. Sturtevant has been the Co-Chairman of the SPIE Microlithography Symposium of the
Advances in Photoresist Technology Conference since 1996. Further, Mr. Sturtevant states that
he has published extensively in the area of polymer physics and polymer chemistry, particularly
with respect to photoresist compositions. (SX 1005, ¶1).
F15. Given Mr. Sturtevant’s background, we conclude that he is qualified to testify as to the
knowledge of one skilled in the art in the field of photolithography and photoresist development.
3. Testimony of Andrew Bell
F16. The parties have submitted testimony from a Mr. Andrew Bell. Mr. Bell is said to have
received a Ph.D. in Organometallic Chemistry from Purdue University in 1985. Mr. Bell
performed research and development in the area of polycyclic olefin polymerization chemistry
for Hercules, Incorporated during the years of 1987 to 1994. From 1994 to 2000, Mr. Bell
performed research and development in the area of polycyclic olefin polymerization chemistry
with a focus on nickel and palladium addition of polycyclic olefins for the B.F. Goodrich
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