Appeal No. 2001-2039
Application No. 09/110,207
With respect to the Examiner’s position related to the
“single pole chuck” and “two pole chuck”, we note that Nagasaki,
describes the wafer support member by referring to figure 1 where
a voltage applied between internal electrode 12 buried in a
ceramic body 11 and an attraction object generates an
electrostatic attraction force (col. 8, lines 4-10).
Additionally, Nagasaki, in col. 12, lines 15-19, points to the
example shown in figure 4 as a single-pole type structure and
reveals that a twin-pole type structure may also be employed
using plural internal electrodes to which power may be fed.
However, Nagasaki provides no further detail of a two-pole
configuration and merely discloses embodiments that include an
additional electrode layer as resistance heating element 307
which are used for heating the chuck (Fig. 12(b) and col. 25,
lines 41-52). Furthermore, we do not find any disclosure in
Nagasaki that teaches or suggests the use of an insulating layer
in a recess between first and second electrodes that has a higher
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