Appeal No. 2002-1148
Application 09/471,662
References relied upon by the appellants
Kaufman 3,156,090 Nov. 10, 1964
James M.E. Harper, “Ion Beam Deposition”, in Thin Film Processes
175-206 (John L. Vossen and Werner Kern eds., Academic Press
1978).
THE REJECTIONS
The claims stand rejected under 35 U.S.C. § 103 as follows:
claims 1, 5 and 8 over Ceasar in view of King; claim 2 over
Ceasar in view of King and Quazi; claims 3 and 4 over Ceasar in
view of King and Arnold; claim 3 over Ceasar in view of King,
Quazi and Arnold; and claims 6 and 7 over Ceasar in view of King,
Quazi and Ion Beam Neutralization.
OPINION
We affirm the rejections of claims 1-7 and reverse the
rejection of claim 8.
Claims 1-7
Among apparatus claims 1-7, claim 1 is the sole independent
claim. As for this claim, Ceasar discloses a sputtering
apparatus for use in an evacuated volume, comprising 1) an ion
source (14) with a device (28) for introducing into the ion
source a gas which is ionizable to produce a plasma having a
prior art.
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