Ex Parte BLANCHARD - Page 7




         Appeal No. 2002-1411                                                         
         Application No. 09/144,535                                                   


         the specification and claims support his definition of the term              
         “self-aligned” as referring to alignment at a region and that the            
         term does not require that all edges remain in line.  See appeal             
         brief, page 15; see also e.g., specification, page 8, lines 17-20            
         and page 9, lines 1-5.                                                       
               The term “self-aligned”, as defined in the                             
               specification and as used in the prior art including                   
               Coe, et al. cited by the Examiner is a structural                      
               limitation that defines the physical position of two or                
               more features with respect to each other.  A                           
               semiconductor structure is “self-aligned” when                         
               different features have a known physical position in                   
               relation to a common third feature each time that                      
               structure is made. . . .  Once a structure is self-                    
               aligned, it cannot ever change and become non-self-                    
               aligned.  Self-aligned is a physical relationship that                 
               is created when the product is formed and remains in                   
               the structure thereafter.                                              
         Appeal brief, page 13.                                                       
               The rejection is reversed.                                             
               2.  Rejection of claims 1, 3-10, 12-15, 17-21, 32-35 and               
         37-41 under 35 U.S.C. § 103 as unpatentable over Mihara in view              
         of Coe                                                                       
               A proper analysis under 35 U.S.C. § 103 requires, inter alia           
         consideration of two factors: (1) whether the prior art would                
         have suggested to those of ordinary skill in the art that they               
         should make the claimed composition or device or carry out the               
         claimed process; and (2) whether the prior art would also have               
         revealed that in so making or carrying out, those of ordinary                

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