Appeal No. 2004-2192
Application No. 09/414,520
in response to introduction of a gas which contains at least
carbon and fluorine, and a gas species is generated which
contains a carbon and fluorine according to a plasma
dissociation, the plasma processing method comprising the steps
of:
generating a plasma, wherein said plasma generation is
effected using an electron cyclotron resonance system in which a
microwave having a frequency of from 300 MHz to 1 GHz is employed
and wherein a degree of plasma dissociation is an intermediate
degree and said gas species containing carbon and fluorine is
generated fully in the plasma, and controlling a temperature of a
region which forms a side wall of said vacuum processing chamber
to have a range of 10°C to 120°C.
7. A plasma processing method according to claim 6, wherein said
plasma generation produces a plasma in which an electron energy
is a range of from 0.25 eV to 1 eV.
9. A plasma processing method according to claim 6, wherein in
said plasma generation, a drive of a plasma exiting power supply
is carried out intermittently.
10. A plasma processing apparatus according to Claim 6, Claim 7
or Claim 9 wherein as a means for adjusting a temperature of said
vacuum wall, a temperature adjusted coolant medium is used.
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