Appeal No. 2005-0285 10
Application No. 09/881,675
The examiner then concludes that it would have been obvious
to select any of the materials disclosed by Kim as a suitable
dielectric material for the interlayer insulating film 14 of the
modified Sakurai device. The examiner also concludes that since
“layer 14 is undoped silicon oxide, the impurity density of the
interlayer insulatiing film 14 is inherently less than 5 mol %”
(answer-page 6).
For their part, appellants merely argue that Kim does not
provide for the deficiencies of the combination of Sakurai, the
Japanese document, and Okamoto. Appellants do not address the
specific limitation of claim 4, wherein the impurity density of
the interlayer insulating film is less than 5 mol %. Since we
find, for the reasons supra, that there is no deficiency in the
combination of Sakurai, the Japanese document, and Okamoto, and
appellants have not convinced us of any error in the examiner’s
rationale, we will sustain the rejection of claim 4 under 35
U.S.C. §103.
Similarly, with respect to claims 6-8, and 10, appellants
merely repeat the argument that the combination of references
(this time, appellants’ Figure 6 (APA), the Japanese document,
and Okamoto) is improper for a lack of motivation to provide a
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 Next
Last modified: November 3, 2007