The opinion in support of the decision being entered today was not written for publication and is not precedent of the Board. UNITED STATES PATENT AND TRADEMARK OFFICE ____________ BEFORE THE BOARD OF PATENT APPEALS AND INTERFERENCES ____________ Ex parte HUNG YIP NG ___________ Appeal No. 2005-0585 Application No. 09/821,478 ____________ ON BRIEF ____________ Before GARRIS, OWENS, and PAWLIKOWSKI, Administrative Patent Judges. PAWLIKOWSKI, Administrative Patent Judge. DECISION ON APPEAL This is a decision under 35 U.S.C. § 134 from the examiner’s final rejection of claims 1, 3, 4-8, 10-14, and 16- 20. Claims 1 and 4 are representative of the subject matter on appeal, and are set forth below: 1. A method of forming a semiconductor device, comprising: lithographically patterning a structure having a first critical dimension, wherein said structure includes nested features and an isolated feature; etching said structure with an O2-containing material to trim said first critical dimension to aPage: 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 NextLast modified: November 3, 2007