Appeal No. 2005-1031
Application No. 09/998,073
46. A system for chemically treating a surface of a workpiece comprising:
a supply of a transmission gas which is substantially nonattenuating to preselected
wavelengths of electromagnetic radiation produced by said system;
a supply of a gaseous constituent;
an inlet structure for exposing the workpiece to a controlled gaseous atmosphere
containing said transmission gas and for providing a flow of said gaseous constituent to the
surface of said workpiece; and
a source of electromagnetic radiation adapted to converge a beam produced thereby in
said flow in close proximity to the surface of the workpiece, but spaced a finite distance
therefrom, to dissociate said gaseous constituent to produce a high flux of activated reactive
species that chemically treats said surface of said workpiece.
64. A system for treating a surface of a workpiece with electromagnetic radiation, said
system comprising:
a first gas source configured to provide a transmission gas defined by a first radiation
absorption coefficient;
a second gas source configured to provide a gaseous constituent defined by a second
radiation absorption coefficient such that said gaseous constituent is more absorptive of said
electromagnetic radiation than said transmission gas;
a chamber comprising:
a workpiece-containing portion; and
an inlet configured to establish fluid communication between said first and second gas
sources and said chamber such that a gaseous atmosphere is defined therein, said gaseous
atmosphere comprising a first region spaced from said workpiece surface and configured to
accept said transmission gas, and a second region disposed between said first region and said
workpiece surface and configured to accept said gaseous constituent; and
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