Appeal No. 2006-1870 Παγε 11
Application No. 10/100,901
8 (col. 18, line 64 through col. 19, line 1), we find that the
polishing means is fixed to the support member.
It is further disclosed that the polishing means is composed
of felt (col. 11, lines 7-10) where it is recited that “[i]n one
embodiment of the present invention, the polishing layer matrix
(prior to solidification) with particle clusters dispersed
therein is coagulated or otherwise coated and solidified upon a
substrate, such as a felt or polymer film.” We additionally note
the disclosure (col. 20, lines 19 and 20) that the abrasive pad
comprises a support layer in addition to the polishing layer.
James additionally discloses that the polishing means has a
density of .20g/cm3 (col. 3, line 37) where it is disclosed that
the polishing layer has a matrix material which has a density of
.20g/cm3 or more. As .5g/cm3 is within the range of .2g/cm3 or
greater, this limitation is met by James. Furthermore, James
discloses that the polishing means has a hardness of 30 or more
(col. 3, line 44) where is disclosed that the hardness of the
polishing layer matrix material is in the range of 25-80 Shore D.
As 30 falls with the range of 25-80, this limitation is met by
James. We additionally find that James discloses abrasive grains
in the felt. It is disclosed (col. 3, lines 9 and 28-30) that
the polishing layer contains particles and that at least a
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