Ex Parte Davis et al - Page 16

                Appeal 2006-2987                                                                                  
                Application 10/661,651                                                                            
                       Claim 8 is the broadest of the argued claims and, therefore, in                            
                considering the general issues for this group of claims, we select claim 8 to                     
                represent the issues on appeal.  Claim 8 requires immersing a reference                           
                panel of the same metal as the blade being treated in the etchant solution to                     
                monitor particular dimensional changes and/or hydrogen absorption.                                
                       Appellants contend that there is no proper motivation taught in Law                        
                for combining the teachings of this reference with those of the other                             
                references (Br. 13-14).  Appellants point out that Law monitors the etching                       
                of a pattern rather than the change in dimension of a part and the two are not                    
                equivalent (Id.).                                                                                 
                       The issue is:  Has the Examiner provided support by a preponderance                        
                of the evidence for the finding of a reason, suggestion, or motivation arising                    
                from within the prior art?                                                                        
                       The evidence sufficiently supports the finding of the Examiner.  As                        
                found by the Examiner, Law describes a process of monitoring the removal                          
                rate during etching (Answer 6; Law, col. 1, ll. 6-10).  The reference panel is                    
                merely a layer of metal on a substrate that is immersed in the same bath as                       
                the workpiece (Law, col. 1, ll. 41-63).  The cumulative amount of metal                           
                removed at any given time from the workpieces and the reference panel is                          
                directly indicated by the location of the edge of the indicator layer (Law,                       
                col. 1, ll. 63-68).  The function of the reference panel is the same whether                      
                the workpiece is etched in a pattern, i.e, masked so that only a pattern is                       
                etched, or completely etched, i.e., immersed without masking.  Therefore, its                     
                use in monitoring of etching processes such as chemical milling is evident                        
                from the nature and function of the process.                                                      



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