Appeal 2007-0465
Application 10/146,813
ll. 51-53). Thus, Williams expressly suggests replacing a classical light
source with an entangled photon source to obtain better resolution. Since
Appellants appear to have merely replaced the classical light source in the
conventional lithography microscope prior art at page 10 of the
Specification, with an entangled photon light source, an obviousness
rejection should be considered.
In addition, the Examiner should consider the relevance of the paper
by Xiaolan Chen and S.R.J. Brueck, Imaging interferometric lithography: A
wavelength division multiplex approach to extending optical lithography,
J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, pp. 3392-3397, which shows
an imaging interferometric lithography optical system in Figure 1 using a
Fourier transform lens pair. This paper discusses integrating optical and
interferometric lithographies to provide arbitrary pattern capability.
CONCLUSION
The rejection of claims 1-3 and 5-7 is affirmed.
The rejection of claim 4 is reversed.
No time period for taking any subsequent action in connection with
this appeal may be extended under 37 C.F.R. § 1.136(a)(1)(iv) (2006).
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