Appeal 2007-0465 Application 10/146,813 AFFIRMED-IN-PART eld Attachment: Xiaolan Chen and S.R.J. Brueck, Imaging interferometric lithography: A wavelength division multiplex approach to extending optical lithography, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, pp. 3392-3397. SUGHRUE MION, PLLC 2100 Pennsylvania Avenue, N.W. Washington, DC 20037-3213 11Page: Previous 1 2 3 4 5 6 7 8 9 10 11
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