Ex Parte Shih et al - Page 11



                Appeal 2007-0465                                                                               
                Application 10/146,813                                                                         
                                           AFFIRMED-IN-PART                                                    









                eld                                                                                            


                Attachment:                                                                                    
                Xiaolan Chen and S.R.J. Brueck, Imaging interferometric lithography: A                         
                wavelength division multiplex approach to extending optical lithography,                       
                J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, pp. 3392-3397.                                  




                SUGHRUE MION, PLLC                                                                             
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