Appeal 2007-1228
Application 10/150,458
1 (2006) from a final rejection of claims 1-9. Examiner's Answer entered
2 September 7, 2006.
3 Claims 10-21 are appear in the application on appeal, but have been
4 withdrawn from further consideration as being drawn to non-elected species.
5 Office Action entered October 10, 2003, page 2; Appeal Brief filed June 23,
6 2006, page 2.
7 The application on appeal has been published as U.S. Patent
8 Application Publication 2003/0213434 A1 (20 November 2003).
9 We have jurisdiction under 35 U.S.C. § 6(b) (2006).
10 As a result of a requirement for an election of species, Applied
11 Materials elected to prosecute the species shown as Fig. 5 in the drawings of
12 the application on appeal.
13 While claim 1-9 read on the elected embodiment of Fig. 5, claim 6 is
14 limited to the Fig. 5 embodiment.
15 With reference to Fig. 1 and Fig. 5 of the drawings, claim 1 reads as
16 follows [bracketed material added]:
17 An apparatus for processing semiconductor substrates, the
18 apparatus comprising:
19 [1] a chamber [Fig. 1; element 1] defining a plasma
20 processing region [Fig. 1, element 16] therein, the chamber
21 including a bottom, a side wall, and a dome [Fig. 1, element 14]
22 disposed on top of the side wall, the dome having a substantially
23 flat dome top;
24 [2] a top RF coil [Fig. 5, element 102] disposed above the
25 dome top, the top RF coil having an outer loop which is larger in
26 size than the substrates to be processed in the chamber;
2
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