Appeal 2007-1312
Application 10/997,715
depositing a first uppercladding layer over the plurality of cores and
within the gaps with a high-density plasma process having a deposition-
sputter ratio between 3:1 and 10:1 to partially fill the gaps, wherein the
deposition-sputter ratio is defined as the ratio of a sum of a net deposition
rate and a blanket sputtering rate to the blanket sputtering rate for the high-
density plasma process; and
depositing a second uppercladding layer over the first uppercladding
layer with a PECVD process to completely fill the gaps.
20. The method recited in claim 1 wherein the first uppercladding
layer has a refractive index between about 1.4443 and 1.4473 at a
wavelength of 1550 nm.
29. The method recited in claim 1 wherein the first uppercladding
layer fills the gaps to approximately 75% of a height of the cores and the
second uppercladding layer fills a remainder of the gaps.
The Examiner relies upon the following references as evidence of
obviousness:
Schneider US 4,557,561 Dec. 10, 1985
Imoto US 4,856,859 Aug. 15, 1989
Dragone US 5,136,671 Aug. 4, 1992
Liu US 6,117,345 Sep. 12, 2000
Narita US 6,122,934 Sep. 26, 2000
Bazylenko US 6,154,582 Nov. 28, 2000
Rossman US 6,194,038 B1 Feb. 27, 2001
Shieh US 6,204,200 B1 Mar. 20, 2001
Ngai US 6,451,686 B1 Sep. 17, 2002
Zhong US 6,705,124 B2 Mar. 16, 2004
Official Notice, Office Action of Jan. 28, 2005 (bottom of page 6)
Appellant’s claimed invention is directed to a method for forming an
optical waveguide on a substrate in a process chamber wherein a plurality of
separated optical cores are formed over an underclading layer that is
deposited upon the substrate. The optical cores define a sequence of gaps
2
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