Appeal 2007-1312
Application 10/997,715
between them and a first upper cladding layer is deposited within the gaps
with a high-density plasma process (HDPCVD). The first upper cladding
layer partially fills the gaps and a second upper cladding layer is deposited
over the first upper cladding layer with a plasma-enhanced chemical vapor
deposition process (PECVD). The HDPCVD process for depositing the first
uppercladding layer has a deposition-sputter ratio between 3:1 and 10:1.
As acknowledged by Appellant, the present application is related to
U.S. Application 10/020,461, which is also presently on appeal before us for
decision (Appeal 2007-1851). The appealed claims of both the present
application and the related application recite the formation of a plurality of
separated optical cores over an undercladding layer having gaps formed
between the cores.
The appealed claims stand rejected under 35 U.S.C. § 103(a) as
follows:
(a) claims 1-7, 13-15, 18, 20, and 29 over Bazylenko in view of
Dragone, Liu, and Shieh;
(b) claim 8 over Bazylenko in view of Dragone, Liu, Shieh, and Ngai;
(c) claims 9-11 over Bazylenko in view of Dragone, Liu, Shieh,
Imoto, and Zhong;
(d) claim 12 over Bazylenko in view of Dragone, Shieh, Liu, Zhong,
Imoto, and Schneider;
(e) claim 16 over Bazylenko in view of Dragone, Liu, Shieh, and
Rossman; and
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