Appeal 2007-2364
Application 09/879,613
Onodera2
15. Onodera describes methods of storing brushes used during the
manufacturing process of electronic devices to wash, make smooth, etc.,
semiconductor wafers and similar substrates. (Onodera at 1:6–15.)
16. The brushes are said to be fibrous or sponge-like, and to be made from
synthetic polymers such as polyvinyl alcohol. (Onodera at 1:39–44.)
17. Fine particles, such as those that can be produced when a brush is
dried and then rewetted, are said to be a contamination problem for
semiconductor wafer surfaces. (Onodera at 1:51 to 2:2.)
18. Microorganisms growing in wet brushes exposed to the atmosphere
are also disclosed to be a contamination problem for semiconductor wafer
surfaces. (Onodera at 2:3–11.)
19. Onodera discloses that these problems may be solved by storing the
brush in a tightly sealed container after soaking the brush in water and filling
the container with an antibacterial liquid. (Onodera at 2:66 to 3:5.)
20. According to Onodera, the brush can be stored for "a very long time,
such as a few months or about half a year." (Onodera at 3:7; 4:54–57.)
21. Examples of bactericidal liquids are said to include an aqueous
solution of 1 to 5% hydrogen peroxide. (Onodera at 3:8-9.)
22. Onodera describes containers that are rigid enough to support the
sponge-like member so it does not experience any "deforming stress."
(Onodera at 4:57–58.)
2 U.S. Patent 6,012,576, issued 11 January 2000, to Naoko Onodera, based
on application 08/684,859, filed 25 July 1996.
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