Ex Parte Skoufis - Page 10

                Appeal  2007-2364                                                                                
                Application 09/879,613                                                                           
                citation omitted).  However, limitations are not to be read from the                             
                specification into the claims.  Renishaw PLC v. Marposs Societa' per Azioni,                     
                158 F.3d 1243, 1248–49, 48 USPQ2d 1117, 1120–21 (Fed. Cir. 1998).                                
                Once a prima facie case of obviousness has been established, the burden                          
                shifts to the applicant to come forward with evidence of unexpected results.                     
                In re Piasecki,745 F.2d 1468, 1472, 223 USPQ 785, 788 (Fed. Cir. 1984).                          
                       We begin with two preliminary observations.  First, although Skoufis                      
                states that certain claims stand or fall separately from others, we find no                      
                colorable argument that the claims are drawn to patentably distinct subject                      
                matter other than the statements that certain limitations are not disclosed by                   
                the references  (FF 35 and 36).  Accordingly, we shall analyze patentability                     
                with regard to claim 9, which is reproduced supra, and we hold that                              
                argument as to the separate patentability of subject matter as claimed                           
                separately has been waived in this appeal.  Second, we note that references                      
                Onodera and Paley are prior art under 102(e), but that Skoufis has not                           
                attempted to antedate these references.  We hold such arguments also to                          
                have been waived in this appeal.                                                                 
                       As to the merits, the Examiner has not directed our attention to any                      
                specific disclosures in Onodera of the use of deionized water, or low metal                      
                ion or anionic "counts" at or below acceptable clean room values.  Nor have                      
                we found such disclosures.  However, as shown by the article from the                            
                McGraw-Hill Encyclopedia of Science and Technology cited supra (FF 29),                          
                semiconductor wafer processing for integrated circuit manufacture is                             
                notoriously sensitive to contamination by particulates and chemical                              
                impurities.  We do not find it credible—and we note that Skoufis has not                         
                denied—that anyone skilled in the relevant arts would have used water that                       

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