Appeal 2007-2983
Application 10/029,583
Appellants’ invention is directed to a method for forming at least one
nanopore useful for forming a mold for deposition of a material or for
aligning molecule(s) in fabricating electronic devices. Claim 1 is illustrative
and reproduced below:
1. A method for forming at least one nanopore for aligning at least one
molecule for molecular electronic devices or for forming a mold for
deposition of a material, comprising:
(a) providing a substrate having a first major surface and a second
major surface, substantially parallel to said first major surface;
(b) forming an etch mask on said first major surface, said etch mask
comprising at least one nanoparticle;
(c) directionally etching said substrate from said first major surface
toward said second major surface, using said etch mask to protect underlying
portions of said substrate against said etching, thereby forming at least one
pillar underneath said etch mask, wherein said directional etching is carried
out using reactive ion etching;
(d) forming a layer of insulating material on said etched substrate,
including around said at least one pillar and at least partially covering said at
least one pillar; and
(e) removing said at least one pillar to leave at least one said nanopore
in said insulating layer.
The Examiner relies on the following prior art references to show
unpatentability:
Deckman US 4,407,695 Oct. 4, 1983
Jun US 5,393,373 Feb. 28, 1995
Brandes US 5,900,301 May 4, 1999
2
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