Appeal No. 95-2454
Application No. 07/396,733
The P+ isolation regions are formed by diffusion of an appropriate impurity into the epitaxial layer.
Specification, pp. 6-8.
The rejections
The examiner presents four separate grounds of rejection:
1. The subject matter of claims 2, 3, 5-9, 12, 14, 15, 19, 20, and 36-48 stands rejected under 35
3 4 5
U.S.C. § 103 over the combination of Frouin, Murphy and Doo;
2. The subject matter of claims 25-35 and 49-59 stands rejected under 35 U.S.C. § 103 over the
combination of Frouin, Murphy, and Doo and Makimoto;6
3
Frouin et al., U.S. Patent 3,500,139, issued March 10, 1970, based upon application 04/713,662, filed
March 18, 1968.
4
Murphy, U.S. Patent 3,649,386, issued March 14, 1972, based upon application 04/723,529 filed,
April 23, 1968.
5
Doo, U.S. Patent 3,386,865, issued June 4, 1968, based upon application 04/454,374, filed May 10,
1965.
6
Makimoto, U.S. Patent 3,596,149, issued July 27, 1972, based upon application 05/4,468 filed,
January 19, 1970.
5
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