Ex parte PELTZER - Page 10




                Appeal No. 95-2454                                                                                                           
                Application No. 07/396,733                                                                                                   


                dioxide.  Doo, col.  2, lines 30-32.  Doo teaches that channels partially filled with silicon dioxide with the               
                remainder a high temperature material such as polycrystalline silicon will also act as an insulator.  Doo, col.              
                5, lines 12-15.                                                                                                              
                        The person having ordinary skill in the art would have recognized that the incorporation of                          
                Murphy’s depression filling technique into Frouin’s process would eliminate (1)  the need to fill the                        
                depressions with polycrystalline silicon material and (2) the subsequent grinding to remove the                              
                polycrystalline silicon material from the surface while still providing the necessary insulation.  The person                
                having ordinary skill in the art would have had a reasonable expectation that silicon oxide alone could be                   
                substituted for polycrystalline silicon and silicon oxide layer in light of Doo’s teaching that silicon oxide and            
                a combination of silicon oxide and polycrystalline silicon are interchangeable for the purpose of electrical                 
                isolation.  Doo, col.  5, lines 12-16.  Accordingly, we conclude that the subject matter of claims 14 and                    
                36 would have been prima facie obvious.                                                                                      
                        Applicant argues that it would not be commercially practical to apply Murphy’s teaching relating                     
                to the filling depressions with oxide to the process described by Frouin.   Brief, p. 12-14.   The basis for                 
                this assertion is that Murphy relates to a thin epitaxial layer of the order of 1 micron and Frouin relates to               
                an epitaxial layer of about 10 microns.   Brief, pp.  12-13.  Applicant asserts that “it is extremely unlikely               
                that it would be commercially feasible to grow a thermal recessed oxide to a thickness in the vicinity of 10                 
                microns.”  Brief, p.  12.                                                                                                    
                        In our view, the argument relating to commercial feasibility is not relevant to the obviousness issue                
                before us.  First, nothing in applicant’s claims limits the claims to (1) any particular thickness of the epitaxial          
                layer or (2) to a commercially feasible process. Second, as noted by the Federal Circuit:                                    
                                 That a given combination would not be made by businessmen for economic                                      
                                 reasons does not mean that persons skilled in the art would not make the                                    
                                 combination because of some technological incompatibility.  Only the latter fact                            
                                 would be relevant.                                                                                          

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