Appeal No. 95-3865
Application 07/714,568
sulfonyl chloride with a polyhydroxy compound, an alkali-soluble
resin and a dye. The dye concentration in the light-sensitive
layer adjacent to or near the support is lower than that in the
other light-sensitive layer since the first layer is obtained by
coating the support with the photosensitive solution (the ester,
resin and a solvent) being free of a dye while the second layer
is obtained by coating with a photosensitive solution of the
ester, resin, dye and a solvent (see claim 26, last 11 lines).
Jain discloses a multi-level positive working photoresist
composition comprising a first layer of an alkali-soluble resin,
an o-quinonediazide compound, and a crosslinker in a solvent,
with the second layer comprising a resin and the o-quinonediazide
compound (column 4, line 11-column 5, line 25). Jain requires
that the first photosensitive composition and the second
photosensitive composition are reactive to ultraviolet radiation
at substantially different wavelengths (column 3, lines 21-23,
column 4, lines 20-21, and column 5, lines 22-25). A dye may be
added to either layer (column 3, lines 15-16 and 25-27). Jain
discloses that these photoresists will be subjected to etchants
and are the choice for the manufacture of densely packed
integrated circuits (column 1, lines 35-46, and column 2, lines
14-15).
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