Appeal No. 95-3865
Application 07/714,568
Regardless of the “interchangeable” chemical ingredients, there
is no suggestion in the secondary references that the plates used
in lithographic printing can be used as a photoresist support.
The examiner notes that the second deficiency in Jain is
that Examples 1-3 do not disclose the 1,2-naphthoquinone-2-
diazide-5-sulfonyl ester in both light sensitive layers. These
examples disclose the 4-sulfonyl ester in the bottom layer and
the 5-sulfonyl ester in the top layer. The examiner refers to
column 19, line 65-column 20, line 2, of Jain for the teaching
that the top layer may comprise a 4- or 5-sulfonyl ester (answer,
page 6) and thus concludes that “interchanging any of the 4
isomers with the 5 isomers would be conventional and known in the
art ... with a reasonable expectation of same or similar results”
(answer, page 7).
However, Jain specifically teaches that “the position of the
sulfonyl group is important” (column 9, line 66-column 10, line
12) in the 1,2-quinonediazide sulfonyl ester reactant for the
first (i.e., the bottom layer) photosensitive composition. Jain
teaches the importance of this bottom layer having the sulfonyl
group in the 4 position (column 10, lines 5-6). The teaching
referred to by the examiner at column 19, line 65, of Jain,
concerns the use of the 4 or 5 sulfonyl esters in the second or
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Last modified: November 3, 2007