Ex parte KIRISAWA et al. - Page 4




               Appeal No. 95-1536                                                                                                      
               Application 07/746,176                                                                                                  


               1995, respectively.                                                                                                     

                                                 Appellants’ Invention                                                                 

                       The invention is a non-volatile semiconductor memory device, and method for accessing data in                   

               a non-volatile semiconductor memory device.  The embodiment of Figures 1-4 includes parallel bit lines                  

               BL1-BL8 provided on a semiconductor substrate.  Memory cells M11…M88 are connected to the bit                           

               lines.  The memory cells comprise cell blocks B1-B8, each of which has a series array of memory cell                    

               transistors connected at a first node QS11-QS81 to a corresponding bit line associated therewith and                    

               connected at a second node to the substrate Vs.  Each of the memory cell transistors has a carrier                      

               storage layer 28 and a control gate electrode 32.                                                                       

                       The memory includes a means for sequentially programming selected memory cell transistors to                    

               write data into a certain memory cell transistor by injection of carriers by tunneling into the carrier                 

               storage layer, and for sequentially erasing the selected memory cell transistors to erase the data stored               

               in the certain memory cell transistor by removing the carriers accumulated in the charge storage layer.                 

                       A data erase operation involves applying a 20 volt pulse to a control gate line SG1.  The                       

               selection transistor QS11 is rendered conductive, and cell block B1 is electrically connected with the                  

               corresponding bit line BL1.  A potential of 20 volts is simultaneously applied to the bit line BL1 while                

               zero volts is applied to the word lines WL1-WL8 in the M1 period of the illustrated                                     




                                                                  4                                                                    





Page:  Previous  1  2  3  4  5  6  7  8  9  10  Next 

Last modified: November 3, 2007