Appeal No. 95-3082
Application No. 08/117,546
According to appellants, the invention is directed to a
positive photoresist composition comprising a mixture of an
alkali-soluble resin and a phenol ester of 1,2-naphthaquinone-
(2)-diazide-6-sulfonic acid (hereafter the “6-isomer”, see the
brief, page 2). Appellants submit that use of the 6-isomer
surprisingly forms a photoresist composition that has
increased sensitivity and a reduced amount of film loss upon
exposure to radiation (Id.).
Claim 13 is illustrative of the subject matter on appeal
and is reproduced below:
13. A positive photoresist composition comprising a
mixture of an alkali-soluble resin and an effective amount of
a photosensitive agent comprising a phenol ester of 1,2-
naphthoquinone-(2)-diazide-6-sulfonic acid, said resin and
photosensitive agent being present in a ratio of 100:2-80.
The following reference has been cited by the examiner to
support the rejection under 35 U.S.C. § 102(e):
Hosaka et al. (Hosaka) 5,215,857 Jun. 1, 1993
(effective filing date of Jul. 18,
1986)
2
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