Appeal No. 95-3082
Application No. 08/117,546
Claims 4 through 15 stand rejected under 35 U.S.C. §
102(e) as anticipated by Hosaka. We reverse this rejection2
for reasons which follow.
OPINION
The photoresist composition recited in appealed claim 13
requires a 100:2-80 mixture of an alkali-soluble resin (most
commonly novolac, see the brief, page 2) and an effective
amount of a phenol ester of the 6-isomer.
The examiner states that Hosaka describes, teaches and
suggests the essential requirements of the claimed subject
matter by disclosing a radiation-sensitive composition
comprising a solution of 100 parts by weight of an alkali-
soluble resin and
5 to 100 parts by weight of a 1,2-quinone diazide compound as
a radiation-sensitive compound, specifically claiming esters
of
2The new ground of rejection on pages 3-4 of the answer
has been withdrawn in view of appellants’ reply brief and
amendment in response to the new ground of rejection (dated
Nov. 10, 1994, Paper No. 24). See the Supplemental Examiner’s
Answer dated
Jan. 19, 1995 (Paper No. 26).
3
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