Appeal No. 96-3019
Application No. 08/386,136
1. A radiation-sensitive layer for use as a photoresist
which is suitable for the production of submicron structures,
comprising:
a polymer component with carboxylic acid anhydride
functions and carboxylic acid tert. butyl ester groups, the
polymer component being alkali insoluble and soluble in a
resist solvent,
a photoinitiator which releases a strong acid when
exposed and
a solvent.
THE REFERENCES OF RECORD
As evidence of obviousness, the examiner relies upon the
following references.
Ito et al. (Ito ‘628) 4,491,628 Jan. 1,
1985
Sebald et al. (Sebald) 0 388 484 Sep. 26,
1990
(published European Patent Application)
Sezi et al. (Sezi) 0 394 740 Oct. 31,
1990
(published European Patent Application)
Ito et al. (Ito(T)), “Thermolysis and Photochemical Acidolysis
of Selected Polymethacrylates,” 21 Macromolecules, No. 5, pp.
1475-82 (1988).
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