Appeal No. 96-4052
Application 08/198,511
EA3): "Forrest illustrates the wide range of semiconductors
that can be used, but does not specifically mention SiC,
however, with Chang's teachings, it would [have] be[en]
obvious to etch SiC (including any of the conventional crystal
forms) in the manner of Forrest (and also to use a light mask,
as taught by Kohl.)" The examiner admits that "Forrest does
not specifically list SiC" (EA4), but states that "Forrest
says 'compound semiconductor' (of which SiC is one) and gives
examples" (EA4-5).
We agree with the examiner's position. In Forrest's
statement that "[t]he electrochemical photoetching procedure
applies to a certain class of semiconductors, namely compound
semiconductors including III-V and II-VI compound
semiconductors" (emphasis added) (col. 2, lines 40-43), the
underlined phrase indicates that the procedure is directed to
"compound semiconductor" including, but not limited to, III-V
and II-VI compound semiconductors. For example, a statement
"a class of persons, namely engineers including engineers
named Bob" means that the group positively includes engineers
named Bob, but may include other engineers with other names.
Thus, we do not agree with appellants' interpretation of
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