Appeal No. 1997-3695
Application No. 08/097,526
and Randall. We find that the Examiner has combined
references containing the necessary pieces present in
Appellant’s claims 1 and 2 without any reason or motivation to
combine. One of ordinary skill in the art would not have
reasonably combined a reference providing a process of using a
sidewall mask for etching existing underlying layers as taught
by Johnson with the method of selective deposition of quantum
dots inside the openings in epitaxy mask of Nishida and
Galeuchet based on the suggestions of Randall which is
directed to etching a pair of quantum dot diodes from existing
layers. Therefore, we reverse the Examiner’s rejection of
claims 1 through 3 under 35 U.S.C.
§ 103 over Nishida, Galeuchet, Johnson, and Randall.
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