Ex parte KAWASAKI et al. - Page 11




          Appeal No. 1998-3043                                                         
          Application 08/667,587                                                       

          important feature of the appellants’ claimed invention.                      
               Additionally, it should be noted that according to the                  
          appellants’ specification, the gate electrode of the                         
          appellants’ field-shield isolation structure must be kept at a               
          constant potential, either at ground or at the level of the                  
          power source, depending on the type of circuit element being                 
          isolated, in order to achieve isolation.  The examiner has not               
          demonstrated that Tanaka’s floating gate electrode 4 and                     
          control gate electrode 9 are confined to a fixed or constant                 
          potential.                                                                   
               The examiner states (answer at 5): “[I]t is not                         
          understood based upon a prior art IEDM reference how Applicant               
          can claim novelty on this [field-shield isolation] feature.                  
          It is not understood why Applicant would cite this reference                 
          for definition purposes and then allege patentability [based]                
          on this very feature.”  The short answer to that question, as                
          indicated by the appellants (Reply from page 4, line 20 to                   
          page 5, line 1), is:                                                         
               [A]pplicant does not allege patentability simply on                     
               a field shield isolation structure.  All of the                         
               independent claims [except for claim 10] on appeal                      
               recite both a field oxide film and field shield                         
               isolation structures formed on the same                                 
               semiconductor substrate in order to obtain a high                       
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