Appeal No. 1998-0038
Application No. 08/236,780
substrate. This appealed subject matter is adequately
illustrated by independent claims 1 and 5 which read as
follows:
1. A method of removing a cryofilm from a cryogenically
cooled substrate, comprising:
forming a plasma with charged ions, and
sputtering said cryofilm off of said substrate by
directing ions from said plasma onto said cryofilm with an
average energy of not more than about 30 eV.
5. A method of removing a cryofilm and organic material
mixture from a substrate, comprising:
sputtering said cryofilm and a portion of said organic
material off of said substrate with a sputtering plasma having
an average ion energy of not more than about 30eV, and
removing the remainder of said organic material from said
substrate by reacting it with a reactive plasma having an
average ion energy of not more than about 30 eV.
The references set forth below are relied upon by the
examiner as evidence of obviousness:
Barrington 3,567,927 Mar. 2, 1971
Benzing 4,786,352 Nov. 22, 1988
Champetier 4,846,425 Jul. 11, 1989
Akishin et al. (Akishin), "The Atomisation of Polymers by
Argon, Helium, and Hydrogen Ions With Energies Up to 30 keV,"
Russian J. of Phys. Chem., 39(12), p. 1637 (Dec. 1965).
Cuomo et al. (Cuomo), "Substrate Cleaning by Low-Energy
Bombardment," IBM Technical Disclosure Bulletin, 10(4),
pp. 352-353 (Sep. 1967).
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