Appeal No. 1998-1548 Page 2
Application No. 08/660,304
The appellants’ invention relates to a high contrast, low
noise alignment mark for laser trimming of redundant memory
arrays. An understanding of the invention can be derived from
a reading of exemplary claim 1 , which is reproduced as2
follows:
1. An alignment mark structure formed on a silicon wafer
comprising:
a base pad;
an anti-reflective-coating (ARC) layer over said base
pad;
an insulative layer over said ARC layer; and
a patterned opening within said insulative layer.
extending through said ARC layer, and terminating in said
base pad.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Kitakata 4,642,672 Feb. 10, 1987
Tominaga 5,525,840 Jun. 11, 1996
(Filed Nov. 9, 1994)
Oka 61-84824 Apr. 30, 1986
2We note that claim 1, line 6 erroneously includes a “.” after the term
layer (1st occurrance). We consider this to be a formality that can be
addressed by the examiner subsequent to this appeal.
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Next
Last modified: November 3, 2007