Ex parte CHIEN et al. - Page 5




          Appeal No. 1998-1548                                       Page 5           
          Application No. 08/660,304                                                  


          insulative layer.  The examiner relies upon the teachings of                
          Tominaga (Figure 3f) for an alignment mark formed by a recess               
          or groove, and concludes that "it would have been obvious to                
          form a groove for use as an alignment mark . . . because this               
          is conventional as noted by Tominaga."  Additionally, the                   
          examiner relies upon Oka's teaching of an accessory pattern in              
          an insulating film, concluding that "it would have been                     
          obvious to form an alignment mark in the oxide film on the                  
          wiring layer in the prior art figures for the same reason,                  
          i.e., to save space."                                                       
               In the alternative line of reasoning presented, the                    
          examiner considers the teachings of Oka in view of the APA and              
          Tominaga, taking the position (answer, pages 5 and 6) that Oka              
          teaches each layer recited in claim 1, with the exception of                
          the anti-reflective-coating layer.  The examiner relies upon                
          Tominaga for a teaching of replacing the raised area of 18, 20              
          of Figure 2 of the APA with alignment marks formed by recesses              
          or grooves, as taught by Tominaga (Figure 3f).  According to                
          the examiner, it would have been obvious to increase the                    
          visibility of the Oka mark by providing Oka with an ARC layer               









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