Appeal No. 1998-1635
Application No. 08/470,596
BACKGROUND
The invention is directed to a plasma chemical vapor reaction method capable
of cyclotron resonance. The method includes the steps of inputting a reactive gas
into a plasma generating space, emitting microwaves into the reaction chamber and
establishing a magnetic field. The magnetic field is said to be established
substantially parallel to the direction of propagation of the microwaves. The
magnetic field is said to cause cyclotron resonance at a position within the reaction
chamber. (Specification, pages 2-4). Claim 24 which is representative of the
invention is reproduced below:
24. A plasma chemical vapor reaction method capable of cyclotron
resonance comprising the steps of:
inputting a reactive gas into a reaction chamber;
emitting microwaves into said reaction chamber at a frequency through a
window in a direction of propagation;
establishing a magnetic field in said reaction chamber where the magnetic
field is directed substantially parallel to the direction of propagation of the
microwaves and has a strength sufficient to cause cyclotron resonance at a position
in the reaction chamber;
2(...continued)
1995, paper no. 6, filed February 7, 1996, after final amendment paper no. 8, filed August 23, 1996, after
final amendment paper no. 11, filed September 5, 1996, after final amendment paper no. 15, filed
October 24, 1996, after final amendment paper no. 17, filed December 17, 1996, and after final amendment
paper no. 24, filed September 3, 1997. All of the after final amendments have been entered in to the present
record by the Examiner.
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