Appeal No. 1998-1635
Application No. 08/470,596
Claims 24 and 28 require the target substrate to be placed in the reaction
chamber at the point of ECR. Claims 24 and 28 also require the strength of the
magnetic field decreases along a line extending through said substrate in the
direction of propagation of the microwaves. Adia I and Adia II disclose the
placement of the target substrate within the electron cyclotron plasma. However,
both are silent as to the recognition of the ECR position and the need for the
magnetic field to decrease along a line extending through said substrate in the
direction of propagation of the microwaves. Asmussen recognizes the ECR zone
and discloses that the ECR zone position can be varied by increasing or decreasing
the strength of the magnets. However, Asmussen does not disclose placing the
target substrate within the ECR position. Asmussen also does not disclose the
magnetic field decreases along a line extending through said substrate in the
direction of propagation of the microwaves. The Examiner has not direct us to
motivation for placing the substrate at the position where ECR is established or
why it would have been obvious to adjust the magnetic field so that it decreases
along a line extending through said substrate in the direction of propagation of the
microwaves.
Claims 25 and 29 are rejected as being unpatentable under 35 U.S.C.
§ 103(a) over Aida I, Aida II and Asmussen in combination with Yamazaki.
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