Appeal No. 1998-1635
Application No. 08/470,596
gas. Magnetic fields are used to adjust the location of the resonating space.
(Specification, page 1, lines 6-13).
Aida I and Aida II are directed the manufacture of ornamental diamonds by
utilization of electron cyclotron resonance chemical vapor deposition. The electron
cyclotron resonance apparatus includes electromagnets arranged on the outside of
the reactor which produce a magnetic field inside the reactor. Microwaves,
hydrogen gas and hydrocarbon gas are introduced into the reactor wherein
cyclotron resonance plasma is generated by electronic discharge resulting from
collision of electrons within the hydrocarbon gas. The plasma provides vapor
phase growth of diamond film on a substrate located within the reactor. (Aida I,
page 3; Aida II, page 4). Aida I and Aida II also discloses controlling the
temperature of the substrate and the and pressure of the reaction chamber. (Aida I,
page 4; Aida II, page 5).
Asmussen is directed to an ion generating apparatus for producing plasma
disk by utilization of ECR. The electron cyclotron resonance apparatus includes
electromagnets arranged on the outside of the plasma chamber region which
produce a magnetic field inside the reactor. Microwaves, hydrogen gas and
hydrocarbon gas are introduced into the reactor. In the plasma region, electron
cyclotron resonance is generated by electronic discharge resulting from collision of
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