Appeal No. 1998-2620
Application No. 08/512,033
2).
According to appellant, the invention is directed to a
method for reducing particulate contamination in a system for
chemical vapor deposition (CVD), including the steps of
heating the section of the pumping line immediately adjacent
to the reaction chamber and by maintaining a slight negative
pressure within the reaction chamber whenever the chamber is
open to the atmosphere (Brief, page 3). A copy of
illustrative claim 1 is attached as an Appendix to this
decision.1
The examiner has relied upon the admitted prior art (as
shown by appellant’s Figure 1) and the following references as
evidence of obviousness:
Chiang 4,395,438 Jul. 26,
1983
Ilderem et al. (Ilderem) 4,957,777 Sep. 18,
1990
Ozaki 5,498,292 Mar. 12,
1We note that claim 1 from the Appendix to the Brief is
incorrect, although the examiner states that this copy of the
claims is correct (Answer, page 2). For example, the step
after “inserting the substrate into said chamber” should be
“closing the bypass vent,” not “opening” the bypass vent. The
other amended portions of this claim are also incorrectly
reproduced in appellant’s Appendix. See claim 1 as found in
the amendment dated May 19, 1997, Paper No. 6.
2
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