Appeal No. 1998-2948
Application 08/400,861
references do not discuss anodic oxidation, that the
references imply the alloys cannot be anodically oxidized.
Appellants argue that none of the references disclose
anodic-oxidizing of an interconnect/electrode film containing
a rare earth element so as to provide an anodic oxidation film
having a thickness in the range of 200 Å or more (Br4; Br5;
Br8-9) or 500 Å or more, as recited in claims 3 and 6
(Br9-10).
Kiyota discloses anodically oxidizing an aluminum alloy
to a thickness of 1000 Å to 10000 Å for the purposes of
increasing the chemical resistance of the conductor layer and
the adhesivity with an insulating layer formed on the wiring
layer, which meets the thickness limitation. If we are
correct that it would have been obvious to substitute an
aluminum/rare earth element alloy for the aluminum alloy in
Kiyota, the motivation for using an anodic oxidation film and
the claimed thickness of the anodically oxidized film is
taught in Kiyota.
Appellants argue that the Examiner has not shown that an
aluminum/rare earth element alloy will maintain the desirable
properties mentioned in the secondary references when it is
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