Ex parte NOGUCHI et al. - Page 11




          Appeal No. 2000-0769                                                        
          Application 08/997,326                                                      

          material would provide the same results.  There must be both a              
          suggestion for the modification and a reasonable expectation                
          of success.  See In re Vaeck, 947 F.2d 488, 493,                            
          20 USPQ2d 1438, 1442 (Fed. Cir. 1991).  Here, because the                   
          advantageous results of silicon on a pseudomorphic SiGe layer               
          are based on the properties of the pseudomorphic SiGe layer,                
          we find no motivation in Solomon for applying silicon to a                  
          poly-SiGe layer or a reasonable expectation that doing so has               
          a reasonable expectation of success.  The Burghartz patent,                 
          although not technically part of the rejection, refers to the               
          Solomon patent and appears to disclose no more than Solomon.                
          Thus, Burghartz does not cure the deficiencies of the                       
          combination.  Ohtani is relied on only for a teaching of                    
          excimer laser annealing and does not cure the deficiencies of               
          the combination of Solomon and King.  We conclude that the                  
          Examiner has failed to establish the motivation to add a                    
          silicon channel layer to a poly-SiGe ally layer in King and,                
          thus, has failed to establish a prima facie case of                         
          obviousness.  The rejection of claims 8 and 10-21 is reversed.              

          Citation of relevant reference                                              


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