Weidman's photodefinable material to make a phase mask
(AR 285, 1 18).
e) "in late December 1992 or early January 199311
Dr. Erdogan states that his lab acquired a chromium-on
silica amplitude mask. The amplitude mask was
converted to a phase mask by reactive-ion etching
followed by stripping of the chromium (AR 286, $ 20).
(This phase mask was ultimately the one used to reduce
the invention to practice) (AR 286-287, 1 22).
f) on 8 January 1993, Dr. Erdogan performed diffraction
measurements to characterize the converted mask (AR
286, $ 21).
g) on 7 January 1993 and 8 January 1993, Dr. Mizrahi
made trial exposures of Tim Weidman's photodefinable
material for the purpose of making a phase mask (AR
275, 1$ 40 and 41).
Hill's conception
46. Hill alleges an 8 September 1992 date of conception
(Paper 272 at 28) .
47. Kenneth 0. Hill (Dr. Hill), one of the Hill inventors,
testified that he, along with B. Malo, F. Bilodeau and D.C.
Johnson co-authored "Photosensitivity in Optical Fibers" (Hill
manuscript) for Volume 23 of the Annual Review of materials
Science, which he alleges describes the elements of the count (HR
12, $$ 21-22).
48. The Hill manuscript describes the method of the count
11
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